ST0019 Hafnium Sputtering Target, Hf
TFM offers Hafnium Sputtering Targets in various forms, purities, sizes,
TFM offers Hafnium Sputtering Targets in various forms, purities, sizes,
TFM offers Hafnium Sputtering Targets in various forms, purities, sizes, and prices. We specialize in high-purity thin film deposition materials with optimal density and minimal grain sizes, which
Discover premium Hafnium (Hf) sputtering targets with 99.9% purity at Stanford Advanced Materials (SAM). Ideal for semiconductor, optical coatings, and thin film deposition, our
Thin hafnium and hafnium carbide films are deposited via pulsed magnetron sputtering of a Hf cathode in argon and acetylene (C 2 H 2) atmosphere at room temperature.
Our comprehensive offering of sputtering targets, evaporation sources and
Heeger Materials is a professional supplier and manufacturer of high-quality Hafnium Sputtering Target, offering competitive prices and customized solutions to meet specific requirements.
Our Hafnium sputtering targets are all made from highest quality, refined crystal bars, which ensures high purity, low zirconium content, and high reliability. Selected sizes are in stock,
Discover premium Hafnium (Hf) sputtering targets with 99.9% purity at Stanford Advanced Materials (SAM). Ideal for semiconductor, optical
Plasmaterials, Inc. provides high purity hafnium and hafnium alloys for all PVD applications. Sputtering targets are produced to fit all commercially available cathode configurations as well
Eagle Alloys is a leading global supplier of pure Hafnium Sputtering Targets for 35+ years. We have Hafnium Sputtering Targets in stock for same-day shipping.
Our comprehensive offering of sputtering targets, evaporation sources and other deposition materials is listed by material throughout the website. Below you will find budgetary pricing for
American Elements specializes in producing high purity Hafnium Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in semiconductor,
Heeger Materials is a professional supplier and manufacturer of high
Get 99.95% pure hafnium sputtering targets for PVD and thin film coating. Precision machined, custom bonded, and ready for global delivery.
Thin hafnium and hafnium carbide films are deposited via pulsed magnetron sputtering of a Hf cathode in argon and acetylene (C 2
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Hafnium Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. Heeger Materials is a professional supplier and manufacturer of high-quality Hafnium Sputtering Target, offering competitive prices and customized solutions to meet specific requirements.
“Hf” is the canonical chemical symbol of hafnium. Hafnium is a lustrous, silvery gray, tetravalent transition metal which chemically resembles zirconium. We also offer other customized shapes and sizes of the sputtering targets, please send us an inquiry for more information.
Hafnium (atomic symbol: Hf, atomic number: 72) is a Block D, Group 4, Period 6 element with an atomic weight of 178.49. The number of electrons in each of Hafnium's shells is 2, 8, 18, 32, 10, 2 and its electron configuration is [Xe] 4f 14 5d 2 6s 2.
Hafnium does not exist as a free element in nature. It is found in zirconium compounds such as zircon. Hafnium is often a component of superalloys and circuits used in semiconductor device fabrication. Its name is derived from the Latin word Hafnia, meaning Copenhagen, where it was discovered.